Pattern created by the self-assembly of a polymer, containing regions of both polystyrene and polymethyl methacrylate (PMMA, Perspex). This polymer automatically organises itself so that areas of the same material align. Here the PMMA has been etched away to enhance the maze-like pattern. This system can be directed to form into specific patterns that are then used as templates for producing nanostructured materials.
Imaged using scanning electron microscopy by Elliot Cheng, University of Queensland. This image has been colour-enhanced.
Size: the raised lines are 17.6 nanometres wide.